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プラズマイオン注入法を用いた薄膜形成、および表面処理
https://it-hiroshima.repo.nii.ac.jp/records/1152
https://it-hiroshima.repo.nii.ac.jp/records/1152efd6961d-f52e-4f76-826b-0e8ca0d2a45e
名前 / ファイル | ライセンス | アクション |
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research56_145-154.pdf (2.9 MB)
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Item type | 紀要論文 / Departmental Bulletin Paper(1) | |||||
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公開日 | 2023-03-30 | |||||
タイトル | ||||||
タイトル | プラズマイオン注入法を用いた薄膜形成、および表面処理 | |||||
タイトル | ||||||
言語 | en | |||||
タイトル | Thin film formation and surface treatment using plasma ion implantation method | |||||
言語 | ||||||
言語 | jpn | |||||
キーワード | ||||||
主題Scheme | Other | |||||
主題 | plasma based ion implantation, plasma density, oxygen, nitrogen | |||||
資源タイプ | ||||||
資源タイプ識別子 | http://purl.org/coar/resource_type/c_6501 | |||||
資源タイプ | departmental bulletin paper | |||||
著者 |
田中, 武
× 田中, 武× Takeshi, TANAKA |
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抄録 | ||||||
内容記述タイプ | Abstract | |||||
内容記述 | In the PBII method, the ion density in the sheath could be obtained based on the modulator equivalent circuit. In the PBII method, the self-ignitting plasma used in the sterilization process was formed, and the plasma density and sheath length could be calculated from the obtained discharge current-high voltage voltage waveform. Using this method, some of the important parameters such as plasma density and sheath length could be obtained when designing the equipment in the future. | |||||
書誌情報 |
広島工業大学紀要. 研究編 巻 56, p. 145-154, 発行日 2022-03 |
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出版者 | ||||||
出版者 | 広島工業大学 | |||||
ISSN | ||||||
収録物識別子タイプ | ISSN | |||||
収録物識別子 | 13469975 | |||||
書誌レコードID | ||||||
収録物識別子タイプ | NCID | |||||
収録物識別子 | AA11599110 | |||||
権利 | ||||||
権利情報 | publisher | |||||
フォーマット | ||||||
内容記述タイプ | Other | |||||
内容記述 | application/pdf |