{"created":"2023-07-25T10:28:22.890896+00:00","id":1152,"links":{},"metadata":{"_buckets":{"deposit":"a45aa433-1625-4f30-9df2-d86b4c76d392"},"_deposit":{"created_by":2,"id":"1152","owners":[2],"pid":{"revision_id":0,"type":"depid","value":"1152"},"status":"published"},"_oai":{"id":"oai:it-hiroshima.repo.nii.ac.jp:00001152","sets":["1:18:391"]},"author_link":["5487","5488"],"item_10002_biblio_info_7":{"attribute_name":"書誌情報","attribute_value_mlt":[{"bibliographicIssueDates":{"bibliographicIssueDate":"2022-03","bibliographicIssueDateType":"Issued"},"bibliographicPageEnd":"154","bibliographicPageStart":"145","bibliographicVolumeNumber":"56","bibliographic_titles":[{"bibliographic_title":"広島工業大学紀要. 研究編"}]}]},"item_10002_description_19":{"attribute_name":"フォーマット","attribute_value_mlt":[{"subitem_description":"application/pdf","subitem_description_type":"Other"}]},"item_10002_description_5":{"attribute_name":"抄録","attribute_value_mlt":[{"subitem_description":"　In the PBII method, the ion density in the sheath could be obtained based on the modulator equivalent circuit. In the PBII method, the self-ignitting plasma used in the sterilization process was formed, and the plasma density and sheath length could be calculated from the obtained discharge current-high voltage voltage waveform. Using this method, some of the important parameters such as plasma density and sheath length could be obtained when designing the equipment in the future.","subitem_description_type":"Abstract"}]},"item_10002_publisher_8":{"attribute_name":"出版者","attribute_value_mlt":[{"subitem_publisher":"広島工業大学"}]},"item_10002_rights_15":{"attribute_name":"権利","attribute_value_mlt":[{"subitem_rights":"publisher"}]},"item_10002_source_id_11":{"attribute_name":"書誌レコードID","attribute_value_mlt":[{"subitem_source_identifier":"AA11599110","subitem_source_identifier_type":"NCID"}]},"item_10002_source_id_9":{"attribute_name":"ISSN","attribute_value_mlt":[{"subitem_source_identifier":"13469975","subitem_source_identifier_type":"ISSN"}]},"item_creator":{"attribute_name":"著者","attribute_type":"creator","attribute_value_mlt":[{"creatorNames":[{"creatorName":"田中, 武"},{"creatorName":"タナカ, タケシ","creatorNameLang":"ja-Kana"}],"nameIdentifiers":[{}]},{"creatorNames":[{"creatorName":"Takeshi, TANAKA","creatorNameLang":"en"}],"nameIdentifiers":[{}]}]},"item_files":{"attribute_name":"ファイル情報","attribute_type":"file","attribute_value_mlt":[{"accessrole":"open_date","date":[{"dateType":"Available","dateValue":"2023-03-30"}],"displaytype":"detail","filename":"research56_145-154.pdf","filesize":[{"value":"2.9 MB"}],"format":"application/pdf","licensetype":"license_note","mimetype":"application/pdf","url":{"label":"research56_145-154.pdf","url":"https://it-hiroshima.repo.nii.ac.jp/record/1152/files/research56_145-154.pdf"},"version_id":"f26936eb-2796-4308-ae67-1aa355d08c4e"}]},"item_keyword":{"attribute_name":"キーワード","attribute_value_mlt":[{"subitem_subject":"plasma based ion implantation, plasma density, oxygen, nitrogen","subitem_subject_scheme":"Other"}]},"item_language":{"attribute_name":"言語","attribute_value_mlt":[{"subitem_language":"jpn"}]},"item_resource_type":{"attribute_name":"資源タイプ","attribute_value_mlt":[{"resourcetype":"departmental bulletin paper","resourceuri":"http://purl.org/coar/resource_type/c_6501"}]},"item_title":"プラズマイオン注入法を用いた薄膜形成、および表面処理","item_titles":{"attribute_name":"タイトル","attribute_value_mlt":[{"subitem_title":"プラズマイオン注入法を用いた薄膜形成、および表面処理"},{"subitem_title":"Thin film formation and surface treatment using plasma ion implantation method","subitem_title_language":"en"}]},"item_type_id":"10002","owner":"2","path":["391"],"pubdate":{"attribute_name":"公開日","attribute_value":"2023-03-30"},"publish_date":"2023-03-30","publish_status":"0","recid":"1152","relation_version_is_last":true,"title":["プラズマイオン注入法を用いた薄膜形成、および表面処理"],"weko_creator_id":"2","weko_shared_id":-1},"updated":"2023-07-25T10:32:28.456112+00:00"}