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The report of joint research over 20 years of the Bulgarian Academy of Sciences and Hiroshima Institute of Technology
https://it-hiroshima.repo.nii.ac.jp/records/980
https://it-hiroshima.repo.nii.ac.jp/records/980e9bc7504-688c-47ad-8691-44cb0f163bc2
| 名前 / ファイル | ライセンス | アクション |
|---|---|---|
research48_105-114.pdf (1.6 MB)
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| Item type | 紀要論文 / Departmental Bulletin Paper(1) | |||||
|---|---|---|---|---|---|---|
| 公開日 | 2023-03-30 | |||||
| タイトル | ||||||
| タイトル | The report of joint research over 20 years of the Bulgarian Academy of Sciences and Hiroshima Institute of Technology | |||||
| 言語 | ||||||
| 言語 | eng | |||||
| キーワード | ||||||
| 主題Scheme | Other | |||||
| 主題 | joint research | |||||
| キーワード | ||||||
| 主題Scheme | Other | |||||
| 主題 | Institute of electronics at the Bulgarian Academy of Sciences | |||||
| キーワード | ||||||
| 主題Scheme | Other | |||||
| 主題 | Hiroshima Institute of Technology | |||||
| 資源タイプ | ||||||
| 資源タイプ識別子 | http://purl.org/coar/resource_type/c_6501 | |||||
| 資源タイプ | departmental bulletin paper | |||||
| 著者 |
Tanaka, Takeshi
× Tanaka, Takeshi× Vutova, Katia× 田中, 武× Vutova, Katia |
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| 抄録 | ||||||
| 内容記述タイプ | Abstract | |||||
| 内容記述 | The Department of Electronics and Computer Engineering, Hiroshima Institute of Technology (EC-HIT) started the international joint research with the Laboratory “Physical Problems of Electron Beam technologies” of the Institute of Electronics, Bulgarian Academy of Sciences (IE-BAS) from 1994. 20 papers, included a book chapter, were published by implementing the international joint research under 5 Agreements for Academic Cooperation and Exchange between HIT and IEBAS. Our international joint research is getting the important position in joint research between Japan and Bulgaria. (The first Agreement for Academic Cooperation and Exchange between the Hiroshima Institute of Technology and the Institute of Electronics of the Bulgarian Academy of Science was signed in 1998. The President of HIT and the President of the BAS and the Director of IE-BAS signed the 4th Agreement in May 2009 and the 5th Agreement was signed in 2012.) The semiconductor fabrication process such as thin film deposition, Electron and Ion Lithography, Etching, Ion implantation, Plasma treatment, etc., evaluation technique such as X-ray photoelectron spectroscopy, optical spectroscopy, X-ray diffraction, etc., and their simulation technology were used for application in industry, medical service, medicine manufacture, biotechnology, dental, etc. In the future, this bilateral research partnership between EC-HIT and IE-BAS becomes more stable and further develops the bilateral relation between HIT and BAS. |
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| 書誌情報 |
広島工業大学紀要. 研究編 巻 48, p. 105-114, 発行日 2014-02 |
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| 出版者 | ||||||
| 出版者 | 広島工業大学 | |||||
| ISSN | ||||||
| 収録物識別子タイプ | ISSN | |||||
| 収録物識別子 | 13469975 | |||||
| 書誌レコードID | ||||||
| 収録物識別子タイプ | NCID | |||||
| 収録物識別子 | AA11599110 | |||||
| フォーマット | ||||||
| 内容記述タイプ | Other | |||||
| 内容記述 | application/pdf | |||||
| 著者版フラグ | ||||||
| 出版タイプ | VoR | |||||
| 出版タイプResource | http://purl.org/coar/version/c_970fb48d4fbd8a85 | |||||
